Film thickness determining method of the silicon isotope superlattices by SIMS

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 1430-1432

  Takano, Akio ^a   Shimizu, Yasuo ^b   Itoh, Kohei M ^b  

^a NTT Advanced Technology Corporation   (Japan)

^b KEIO UNIVERSITY   (Japan)

Author keywords

Depth profile; Isotope; MRI; SIMS; Superlattices

Indexed keywords

DEPTH PROFILING; FILM THICKNESS; ISOTOPES; MAGNETIC RESONANCE IMAGING; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DEVICE MANUFACTURE; SUPERLATTICES;

CONVENTIONAL METHODS; DEPTH DISTRIBUTION; DETERMINING METHOD; SELF-DIFFUSION; SEMICONDUCTOR INDUSTRY; SHORT PERIODS; SILICON ISOTOPES; SIMS PROFILE;

SEMICONDUCTING SILICON;

EID: 56449131114     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.06.099     Document Type: Article

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