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Journal of Analytical Atomic Spectrometry

Volumn 24, Issue 6, 2009, Pages 734-741

The concept of plasma cleaning in glow discharge spectrometry

(17) Molchan, I S a Thompson, G E a Skeldon, P a Trigoulet, N a Chapon, P b Tempez, A b Malherbe, J b Lobo Revilla, L c Bordel, N c Belenguer, Ph d Nelis, T d Zahri, A d Therese, L e Guillot, Ph e Ganciu, M f,g Michler, J h Hohl, M h

a UNIVERSITY OF MANCHESTER (United Kingdom)

b HORIBA LTD (Japan)

c UNIVERSITY OF OVIEDO (Spain)

d Laboratoire Plasma et Conversion d'Energie (France)

e UNIVERSITÉ DE TOULOUSE (France)

f NATIONAL INSTITUTE FOR LASER (Romania)

g UNIVERSITÉ PARIS SUD (France)

h SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; GLOW DISCHARGES; MASS SPECTROMETRY; OPTICAL EMISSION SPECTROSCOPY;

DISCHARGE SOURCE; ELEMENTAL DEPTH PROFILING; GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRIES; GLOW DISCHARGE SPECTROMETRIES; LAYERED MATERIAL; MODELLING AND VALIDATION; NORMAL CONDITION; SACRIFICIAL MATERIAL;

DEPTH PROFILING;

EID: 68049102223 PISSN: 02679477 EISSN: 13645544 Source Type: Journal
DOI: 10.1039/b818343k Document Type: Article

Times cited : (37)

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