C4F8 dissociation in an inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1038-1047

  Radtke, M T ^a   Coburn, J W ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CALCULATIONS; CARRIER CONCENTRATION; DISSOCIATION; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; IONIZATION; MASS SPECTROMETRY; PLASMA DENSITY; PLASMA PROBES; POSITIVE IONS;

APPEARANCE POTENTIAL MASS SPECTROMETRY; ELECTRON ENERGY DISTRIBUTION FUNCTION; GAS TEMPERATURE; ION MASS SPECTROMETRY; LANGMUIR PROBE; TOTAL NEUTRAL NUMBER DENSITY;

FLUORINE COMPOUNDS;

EID: 0042030912     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1582456     Document Type: Article

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