Integrated framework for the flux calculation of neutral species inside trenches and holes during plasma etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2008-2020

  Kokkoris, George ^a   Boudouvis, Andreas G ^b   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL SYMMETRY; FLUX CALCULATION; GAS CHOPPING; INTEGRATED FRAMEWORKS; NEUTRAL SPECIES;

ALGORITHMS; INTEGRAL EQUATIONS; IONS; NONLINEAR EQUATIONS; PLASMA ETCHING; PROBLEM SOLVING; REACTIVE ION ETCHING; SILICA;

FLUXES;

EID: 33750935292     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2345643     Document Type: Article

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