CFX radical generation by plasma interaction with fluorocarbon films on the reactor wall

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2083-2087

  Miyata, Koji ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030490124     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580084     Document Type: Article

References (13)

1. K. Suzuki, S. Okudaira, N. Sakudo, and I. Kanomata, Jpn. J. Appl. Phys. 16, 1979 (1977).
2. H. Hayashi, T. Ohiwa, H. Tamura, M. Matsusita, I. Hasegawa, K. Horioka, and H. Okano, Proceedings of 14th Dry Process Symposium (The Institute of Electrical Engineers of Japan, Tokyo, 1992), p. 205.
3. Y. Hikosaka, M. Nakamura, and H. Sugai, Jpn. J. Appl. Phys. 33, 2157 (1994).
4. K. Maruyama and T. Goto, J. Appl. Phys. 28, 884 (1995).
5. K. Miyata, K. Takahashi, S. Kishimoto, M. Hori, and T. Goto, Jpn. J. Appl. Phys. 34, L444 (1995).
6. K. Miyata, K. Takahashi, S. Kishimoto, M. Hori, and T. Goto Proceedings of 16th Dry Process Symposium (The Institute of Electrical Engineers of Japan, Tokyo, 1994), p. 193.
7. M. Magnae, N. Itabashi, N. Nishiwaki, T. Goto, C. Yamada, and E. Hirota, Jpn. J. Appl. Phys. 29, L829 (1990).
8. K. Takahashi, M. Hori, K. Maruyama, S. Kishimoto, and T. Goto, Jpn. J. Appl. Phys. 32, L694 (1993).
9. K. Maruyama, A. Sakai, and T. Goto, J. Phys. D 26, 199 (1993).
10. K. Kawaguchi, C. Yamada, Y. Hamada, and E. Hirota, J. Mol. Spectrosc. 86, 5602 (1981).
11. P. B. Davies, W. Lewis-Bevan, and D. K. Russel, J. Chem. Phys. 75, 5602 (1981).
12. C. Yamada and E. Hirota, J. Chem. Phys. 78, 1703 (1983).
13. T. Ono, R. Hamasaki, and T. Mizutani, Jpn. J. Appl. Phys. 33, L1717 (1994).