Run-to-run evolution of fluorocarbon radicals in C4F8 plasmas interacting with cold and hot inner walls

Journal of the Electrochemical Society

Volumn 147, Issue 11, 2000, Pages 4273-4278

  Oshio, Hidetaka ^a   Ichiki, Takanori ^a   Horiike, Yasuhiro ^b  

^a TOYO UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COOLING WATER; FILM GROWTH; FLUOROCARBONS; PLASMA DENSITY; SILICON COMPOUNDS;

FLUOROCARBON POLYMER FILMS; FLUOROCARBON RADICALS; INDUCTIVELY COUPLED PLASMAS (ICP);

PLASMA INTERACTIONS;

EID: 0034323313     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394052     Document Type: Article

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