Mechanisms for CF2 radical generation and loss on surfaces in fluorocarbon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2661-2668

  Zhang, Da ^a,b   Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; FLUOROCARBONS; ION BOMBARDMENT; MATHEMATICAL MODELS; PLASMA DENSITY; PLASTIC FILMS; SPUTTERING; SURFACE PHENOMENA;

CARBON DIFLUORIDE;

PLASMA ETCHING;

EID: 0034347746     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319816     Document Type: Article

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