Loss processes of CF and CF2 radicals in the afterglow of high-density CF4 plasmas

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 6, 1997, Pages

  Suzuki, Chihiro ^a   Sasaki, Koichi ^a   Kadota, Kiyoshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; FLUORESCENCE; PRESSURE EFFECTS; SPECTROSCOPY;

LASER INDUCED FLUORESCENCE; SURFACE LOSS PROBABILITY;

PLASMA ETCHING;

EID: 0031153374     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l824     Document Type: Article

References (11)