Plasma-surface interactions of nanoporous silica during plasma-based pattern transfer using C 4F 8 and C 4F 8/Ar gas mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 151-164

  Hua, Xuefeng ^a   Stolz, Christian ^b,f   Oehrlein, G S ^b   Lazzeri, P ^c   Coghe, N ^c   Anderle, M ^c   Inoki, C K ^d   Kuan, T S ^d   Jiang, P ^e  

^a University of Maryland   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c ITC IRST   (Italy)

^d STATE UNIVERSITY OF NEW YORK   (United States)

^e TEXAS INSTRUMENTS   (United States)

^f Fachhochschule Mannheim   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

NANOPOROUS SILICA; PLASMA SURFACE INTERACTIONS; POLYMERIZING PLASMAS;

PLASMAS; PORE SIZE; POROSITY; SILICA; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 27144505201     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821584     Document Type: Article

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