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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volumn 20, Issue 1, 2002, Pages 14-23
Model for an inductively coupled Ar/c-C4F8 plasma discharge
(2)
Rauf, Shahid
a
Ventzek, Peter L G
a
a
MOTOROLA INC
(
United States
)
Author keywords
[No Author keywords available]
Indexed keywords
APPROXIMATION THEORY; CARRIER CONCENTRATION; DISSOCIATION; ELECTRIC DISCHARGES; ELECTRONS; ETCHING; FLUOROCARBONS; INTERFEROMETRY; IONIZATION; MATHEMATICAL MODELS; MICROELECTRONICS; PLASMAS;
DIELECTRIC ETCHING; ELECTRON IMPACT DISSOCIATION; ELECTRON IMPACT PROCESSES; ELECTRON TEMPERATURE; ELECTRONEGATIVE; ELECTROPOSITIVE; NEGATIVE ION DENSITY; PLASMA DISCHARGE;
INDUCTIVELY COUPLED PLASMA;
EID
:
0036162845
PISSN
:
07342101
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1116/1.1417538
Document Type
:
Article
Times cited : (
68
)
References (
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