Surface productions of CF and CF2 radicals in high-density fluorocarbon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2222-2226

  Suzuki, C ^a   Sasaki, K ^a   Kadota, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032336855     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581331     Document Type: Article

References (12)

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