Plasma deposition of low-dielectric-constant fluorinated amorphous carbon

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2739-2745

  Endo, Kazuhiko ^a   Shinoda, Keisuke ^a   Tatsumi, Toru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001295231     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371119     Document Type: Article

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