Production and destruction of CFx radicals in radio-frequency fluorocarbon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 384-390

  Haverlag, M ^a,b   Stoffels, W W ^a   Stoffels, E ^a   Kroesen, G M W ^a   De Hoog, F J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS LIGHTING   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRIC DISCHARGES; ELECTRODES; FLUOROCARBONS; INFRARED SPECTROSCOPY; MOLECULES; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PLASMAS; SEMICONDUCTOR LASERS; SPECTROMETERS;

INFRARED ABSORPTION SPECTROSCOPY; PLASMA GLOW; RADIO FREQUENCY DISCHARGES;

FREE RADICALS;

EID: 0030104436     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580094     Document Type: Article

References (22)

1. J.P. Booth, G. Hancock, N.D. Perry, and M.J. Toogood, J. Appl. Phys. 66, 5251 (1989).
2. J.P. Booth, G. Hancock, and N.D. Perry, Appl. Phys. Lett. 50, 318 (1987).
3. S.G. Hansen, G. Luckman, G.C. Nieman, and S.D. Colson, J. Appl. Phys. 68, 2013 (1990).
4. J.W. Thoman, K. Suzuki, S.H. Kable, and J.I. Steinfeld, J. Appl. Phys. 60, 2775 (1986).
5. M. Haverlag, E. Stoffels, W.W. Stoffels, G.M.W. Kroesen. and F.J. de Hoog J. Vac. Sci. Technol. A 12, 3102 (1994).
6. K. Takahashi, M. Hori, and T. Goto, Jpn. J. Appl. Phys. 32, L1088 (1993).
7. K Takahashi, M. Hori, S. Kishimoto, and T. Goto, Jpn. J. Appl. Phys. 33, 4181 (1994).
8. M. Haverlag, E. Stoffels, W.W. Stoffels, J.H.W.G. den Boer, G.M.W. Kroesen, and F.J. de Hoog, Jpn. J. Appl. Phys. 33, 4202 (1994).
9. K. Maruyama and T. Goto, J. Phys. D 28, 884 (1995).
10. W.W. Stoffels, E. Stoffels, M. Haverlag, G.M.W. Kroesen, and F.J. de Hoog, J. Vac. Sci. Technol A 13, 2058 (1995).
11. K. Kawaguchi, C. Yamada, Y. Hamada, and E. Hirota, J. Mol. Spectrosc. 86, 136 (1981).
12. L.H. Jones, C. Kennedy, and S. Ekberg, J. Chem. Phys. 69, 833 (1978).
13. M. Haverlag, Ph.D. thesis, Eindhoven University of Technology, The Netherlands, 1991.
14. C. Yamada and E. Hirota, J. Chem. Phys. 78, 1703 (1983).
15. M. Haverlag, E. Stoffels, W.W. Stoffels, G.M.W. Kroesen, and F.J. de Hoog, J. Vac. Sci. Technol. A 14, 380 (1996).
16. T. Arai, M. Goto, Y. Asoh, D. Takayama, and T. Shimizu, Proceedings of the 11th International Conference on Phenomena in Ionized Gases, Bochum, Germany, 1993, edited by G. Ecker (unpublished), Vol. II, p. 1.
17. E. Stoffels and W.W. Stoffels, Ph.D. thesis, Eindhoven University of Technology, The Netherlands, 1994.
18. R.J.M.N. Snijkers, Ph.D. thesis, Eindhoven University of Technology, The Netherlands, 1993.
19. J.A.G. Baggerman, R.J. Visser, and E.J.H. Collart, Proceedings of the 11th International Symposium on Plasma Chemistry, Loughborough, United Kingdom, 1993, edited by J. Harry (unpublished), p. 1410.
20. T.H. Fedynyshyn, G.W. Grynkewich, and R.H. Dumas, J. Electrochem. Soc. 134, 2580 (1987).
21. T.H. Fedynyshyn, G.W. Grynkewich, B.A. Chen, and T.P. Ma, J. Electrochem. Soc. 136, 268 (1988).
22. D.C. Gray, I. Tepermeister, and H.H. Sawin, Proceedings of the 2nd International Conference on Reactive Plasmas and 11th Symposium on Plasma Processing, Yokohama, Japan, 1994, edited by T. Goto (unpublished).