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Volumn 28, Issue 4, 1999, Pages 967-982

Electron interactions with plasma processing gase: An update for CF4, CHF3, C2F6, and C3F8

Author keywords

Attachment; C2F6; C3F8; CF4; CHF3; Cross sections; Dissociation; Electron interactions; Ionization; Scattering; Transport coefficients

Indexed keywords

DISSOCIATION; IONIZATION; SCATTERING;

EID: 0033268821     PISSN: 00472689     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.556042     Document Type: Article
Times cited : (166)

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    • Y. Wang, L. G. Christophorou, J. K. Olthoff, and J. K. Verbrugge, in Gaseous Dielectrics VIII, edited by L. G. Christophorou and J. K. Olthoff (Plenum, New York, 1998), p. 39; Y. Wang, L. G. Christophorou, J. K. Olthoff, and J. K. Verbrugge, Chem. Phys. Lett. 304, 303 (1999).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.