Modeling of magnetically enhanced capacitively coupled plasma sources: Ar/C4F8/O2 discharges

Journal of Applied Physics

Volumn 95, Issue 3, 2004, Pages 834-845

  Vasenkov, Alex V ^a,b   Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b CFD RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; ELECTRIC FIELDS; ELECTRON MOBILITY; FLUORINE COMPOUNDS; HYDRODYNAMICS; IONS; MAGNETIC FIELDS; MATHEMATICAL MODELS; MONTE CARLO METHODS; OXYGEN; REACTIVE ION ETCHING;

DC BIAS; ION ENERGIES; MAGNETICALLY ENHANCED CAPACITIVELY COUPLED PLASMA SOURCES; MAGNETICALLY ENHANCED REACTIVE ION ETCHING REACTORS;

PLASMA SOURCES;

EID: 1142280316     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1633661     Document Type: Article

References (47)

1. R. A. Lindley, C. H. Bjorkman, H. Shan, K.-H. Ke, K. Doan, R. R. Mett, and M. Welch, J. Vac. Sci. Technol. A 16, 1600 (1998).
2. K. E. Davies, M. Gross, and C. M. Horwitz, J. Vac. Sci. Technol. A 11, 2752 (1993).
3. M. J. Buie, J. T. P. Pender, and P. L. G. Ventzek, Jpn. J. Appl. Phys., Part 1 36, 4838 (1997).
4. P. Berruyer, F. Vinet, H. Feldis, R. Blanc, M. Lerme, Y. Morand, and T. Poiroux, J. Vac. Sci. Technol. A 16, 1604 (1998).
5. C. T. Gabriel, J. Vac. Sci. Technol. B 20, 1542 (2002).
6. C. O. Jung, K. K. Chi, B. G. Hwang, J. T. Moon, M. Y. Lee, and J. G. Lee, Thin Solid Films 341, 112 (1999).
7. M. J. Buie, J. T. P. Pender, and M. Dahimene, J. Vac. Sci. Technol. A 16, 1464 (1998).
8. A. P. Paranjipe, M. M. Moslehi, and C. J. Davis, J. Vac. Sci. Technol. A 10, 1140 (1992).
9. M. J. Kushner, J. Appl. Phys. 94, 1436 (2003).
10. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, J. Appl. Phys. 65, 3816 (1989).
11. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, J. Appl. Phys. 65, 3825 (1989).
12. D. A. W. Hutchinson, M. M. Turner, R. A. Doyle, and M. B. Hopkins, IEEE Trans. Plasma Sci. 23, 636 (1995).
13. S. V. Avtaeva, M. Z. Manytbekov, and D. K. Otorbaev, J. Phys. D 30, 3000 (1997).
14. J.-C. Park and B. Kang, IEEE Trans. Plasma Sci. 25, 499 (1997).
15. M. A. Lieberman, A. J. Lichtenberg, and S. E. Sava, IEEE Trans. Plasma Sci. 19, 189 (1991).
16. M. Meyyappan, J. Appl. Phys. 71, 2574 (1992).
17. M. Meyyappan and T. R. Govindan, J. Vac. Sci. Technol. A 10, 1344 (1992).
18. K. Miyata, M. Hori, and T. Goto, J. Vac. Sci. Technol. A 15, 568 (1997).
19. J.-P. Booth, Plasma Sources Sci. Technol. 8, 249 (1999).
20. K. Sasaki, Y. Kawai, C. Suzuki, and K. Kadota, J. Appl. Phys. 83, 7482 (1998).
21. X. Li, L. Ling, X. Hua, M. Fukasawa, and G. S. Oehrlein, J. Vac. Sci. Technol. A 21, 284 (2003).
22. M. Matsui, T. Tatsumi, and M. Sekine, J. Vac. Sci. Technol. A 19, 2089 (2001).
23. M. Matsui, T. Tatsumi, and M. Sekine, J. Vac. Sci. Technol. A 19, 1282 (2001).
24. A. V. Vasenkov, X. Li, G. S. Oehrlein, and M. J. Kushner, J. Vac. Sci. Technol. A (to be published).
25. C. Winstead and V. McKoy, J. Chem. Phys. 114, 7407 (2001).
26. G. I. Font, W. L. Morgan, and G. Mennenga, J. Appl. Phys. 91, 3530 (2002).
27. C. Q. Jiao, A. Garscadden, and P.D. Haaland, Chem. Phys. Lett. 297, 121 (1998).
28. L.G. Christophorou and J. K. Olthoff, J. Phys. Chem. Ref. Data 30, 449 (2001).
29. P. W. Harland and J. L. Franklin, J. Chem. Phys. 61, 1621 (1974).
30. I. Sauers, L. G. Christophorou, and J. G. Carter, J. Chem. Phys. 71, 3016 (1979).
31. J. E. Sanabia, G. D. Cooper, J. A. Tossell, and J. H. Moore, J. Chem. Phys. 108, 389 (1998).
32. H. Toyoda, M. Iio, and H. Sugai, Jpn. J. Appl. Phys., Part 1 36, 3730 (1997).
33. S. Rauf and P. L. G. Ventzek, J. Vac. Sci. Technol. A 20, 14 (2002).
34. S. H. Bauer and S. Javanovic, Int. J. Chem. Kinet. 30, 171 (1998).
35. A. Yokoyama, K. Yokoyama, and G. Fujisawa, Chem. Phys. Lett. 237, 106 (1995).
36. K. Yoshida, S. Goto, H. Tagashira, C. Winstead, B. V. McKoy, and W. L. Morgan, J. Appl. Phys. 91, 2637 (2002).
37. C. Winstead and V. McKoy, J. Chem. Phys. 116, 1380 (2002).
38. J. T. Moseley, R. E. Olson, and J. R. Peterson, Case Stud. At. Phys. 5, 1 (1975).
39. A. P. Hickman, J. Chem. Phys. 70, 4872 (1979).
40. M. A. Biondi, in Principles of Laser Plasmas, edited by G. Bekefi (Wiley, New York, 1976).
41. X. Li, L. Ling, X. Hua, G. S. Oehrlein, Y. Wang, A. V. Vasenkov, and M. J. Kushner, J. Vac. Sci. Technol. A (submitted).
42. Y. Hirose, I. Ishikawa, S. Sasaki, K. Nakeskei, Y. Saito, and S. Suganomata, Jpn. J. Appl. Phys., Part 1 37, 5730 (1998).
43. G. K. Jarvis, C. A. Mayhew, and R. P. Tuckett, J. Phys. Chem. 100, 17166 (1996).
44. 4. See E. R. Fisher, M. E. Weber, and P. B. Armentrout, J. Chem. Phys. 92, 2296 (1990).
45. M. A. Sobolewski, Y. Wang, and A. Goyette, J. Appl. Phys. 91, 6303 (2002).
46. N. Mizutani and T. Hayashi, J. Vac. Sci. Technol. A 19, 1298 (2001).
47. G. S. Oehrlein, M. F. Doemling, B. E. E. Kastenmeier, P. J. Matsuo, N. R. Rueger, M. Schaepkens, and T. E. F. M. Standaert, IBM J. Res. Dev. 42, 181 (1999).