SCOPUS 정보 검색 플랫폼

Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 403-410

Evaluation of new molecular resist for EUV lithography

(9) Oizumi, Hiroaki a,b Tanaka, Yuusuke a Kumise, Takaaki a Shiono, Daiju c Hirayama, Taku c Hada, Hideo c Onodera, Junichi c Yamaguchi, Atsuko d Nishiyama, Iwao a

a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

b KYUSHU INSTITUTE OF TECHNOLOGY (Japan)

c TOKYO OHKA KOGYO CO LTD (Japan)

d HITACHI LTD (Japan)

Author keywords

EUV lithography; LER; Molecular resist; Outgassing; Polyphenol

Indexed keywords

EID: 36148974393 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.20.403 Document Type: Article

Times cited : (34)

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