Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HINA)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2975-2979

  Oshino, Tetsuya ^a   Takahashi, Shinichi ^a   Yamamoto, Takahiro ^a   Miyoshi, Tatsuya ^a   Shiraishi, Masayuki ^a   Komiya, Takaharu ^a   Kandaka, Noriaki ^a   Kondo, Hiroyuki ^a   Mashima, Kiyoto ^a   Nomura, Kazushi ^a   Murakami, Katsuhiko ^a   Okuyama, Takeshi ^b   Oizumi, Hiroaki ^c   Nishiyama, Iwao ^c   Okazaki, Shinji ^c  

^a NIKON CORPORATION   (Japan)

^b Semiconductor Metrology Department   (Japan)

^c ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; DIFFRACTION; INTERFEROMETERS; LIGHT INTERFERENCE; LITHOGRAPHY; MIRRORS; OPTICAL DEVICES; OPTICS; OPTIMIZATION; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; WAVEFRONTS;

HIGH-NUMERICAL-APERTURE EXTREME ULTRAVIOLET EXPOSURE TOOLS (HINA); LOW-SPATIAL-FREQUENCY ROUGHNESS (LSFR); MID-SPATIAL-FREQUENCY ROUGHNESS (MSFR); PROJECTION OPTICS;

PROJECTION SYSTEMS;

EID: 19944430107     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808734     Document Type: Conference Paper

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