Scaling of Tg and reaction rate with film thickness in photoresist: A thermal probe study

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3376-3380

  Fryer, David S ^a   Nealey, Paul F ^a   De Pablo, Juan J ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS TRANSITION; PLASTIC FILMS; POLYSTYRENES; RADIATION EFFECTS; RATE CONSTANTS; SEMICONDUCTING FILMS; THERMOANALYSIS; ULTRATHIN FILMS;

THERMAL PROBE TECHNIQUE;

PHOTORESISTS;

EID: 0034352181     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1324621     Document Type: Article

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