New photoresist based on amorphous low molecular weight polyphenols

Journal of Photopolymer Science and Technology

Volumn 17, Issue 3, 2004, Pages 435-440

  Hirayama, Taku ^a   Shiono, Daiju ^a   Hada, Hideo ^a   Onodera, Junichi ^a   Ueda, Mitsuru ^b  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous polyphenols; Chemical amplification positive tone resist; Low molecular weight

Indexed keywords

1 ETHOXYETHYL DERIVATIVE; 4,4' METHYLENEBIS[2 [BIS(2 METHYL 4 HYDROXY 5 CYCLOHEXYLPHENYL)METHYL]PHENOL; 4,4' METHYLENEBIS[2 [BIS(HYDROXY 2,5 DIMETHYLPHENYL)]METHYL]PHENOL; BASE; ETHYLENE DERIVATIVE; POLY(4 HYDROXYSTYRENE); POLYPHENOL DERIVATIVE; TETRAMETHYLAMMONIUM; TETRAMETHYLAMMONIUM HYDROXIDE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; DISSOLUTION; ELECTRON BEAM; MOLECULAR WEIGHT; STRUCTURE ANALYSIS; SURFACE PROPERTY;

EID: 3142631823     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.435     Document Type: Article

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