Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 102-109

  Oizumi, H ^a   Tanaka, Y ^a   Kumasaka, F ^a   Nishiyama, I ^a   Kondo, H ^b   Shiraishi, M ^b   Oshino, T ^b   Sugisaki, K ^b   Murakami, K ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Annular illumination; Coherent illumination; EUV Lithography; Flare; Partially coherent illumination

Indexed keywords

ERROR ANALYSIS; LIGHT SOURCES; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION;

ANNULAR ILLUMINATION; EUV LITHOGRAPHY; FLARE; PARTIALLY COHERENT ILLUMINATION;

OPTICAL DEVICES;

EID: 24644503076     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599435     Document Type: Conference Paper

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