Evaluation of multilayer damage in EUVL mask fabrication process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 1377-1384

  Tanaka, Yuusuke ^a   Nishiyama, Iwao ^a   Abe, Tsukasa ^b   Sasaki, Shiho ^b   Hayashi, Naoya ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Anneal; Centroid; Cr; Damage; EUV; Mask; Multilayer; Process; Reflectivity; TaGeN

Indexed keywords

ANNEALING; CHROMIUM; ERROR ANALYSIS; HIGH TEMPERATURE EFFECTS; MASKS; OPTICAL MULTILAYERS; PLASMA ETCHING; ULTRAVIOLET RADIATION;

ANNEAL; CENTROID; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); TAGEN;

PHOTOLITHOGRAPHY;

EID: 19844371227     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568984     Document Type: Conference Paper

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