Performance of molecular resist based on polyphenol in EUV lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1107-1110

  Oizumi, Hiroaki ^a   Kumasaka, Fumiaki ^a   Tanaka, Yuusuke ^a   Hirayama, Taku ^b   Shiono, Daiju ^b   Hada, Hideo ^b   Onodera, Junichi ^b   Yamaguchi, Atsuko ^c   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

^c HITACHI LTD   (Japan)

Author keywords

EUV lithography (EUVL); Line edge roughness (LER); Molecular resist; Polyphenol

Indexed keywords

COHERENT LIGHT; LIGHTING; LITHOGRAPHY; MOLECULAR WEIGHT; NUMERICAL ANALYSIS; PATTERN RECOGNITION; PHOTOCHEMICAL REACTIONS;

EUV LITHOGRAPHY (EUVL); LINE-EDGE ROUGHNESS (LER); MOLECULAR RESISTS; POLYPHENOLS;

ALCOHOLS;

EID: 33748269339     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.025     Document Type: Article

References (32)

1. Silverman P.J. Proc. SPIE 4343 (2001) 12
2. International Technology Roadmap for Semiconductors, 2004.
3. Fujita J., et al. Appl. Phys. Lett. 68 (1996) 1297
4. Tully D.C., et al. Adv. Mater. 12 (2000) 1118
5. Kim J.-B., et al. Chem. Lett. 10 (2002) 1064
6. Kihara N., et al. J. Photopolym. Sci. Technol. 11 (1998) 553
7. Uchino S., et al. J. Vac. Sci. Technol. B16 (1998) 3684
8. Hirayama T., et al. J. Photopolym. Sci. Technol. 17 (2004) 435
9. Chang S.W., et al. Proc. SPIE 5753 (2005) 5
10. Fdynyshyn T.H., et al. Proc. SPIE 5753 (2005) 281
11. Hirayama T., et al. Jpn. J. Appl. Phys. 44 (2005) 5484
12. D. Niakoula et al., Microelectron. Eng. (in this volume).
13. Robinson A.P.G., et al. J. Vac. Sci. Technol. B18 (2000) 2730
14. Oizumi H., et al. Proc. SPIE 5751 (2005) 102
15. Hosokawa T., et al. Rev. Sci. Instrum. 60 (1989) 1783
16. Oshino T., et al. J. Vac. Sci. Technol. B22 (2004) 2975
17. Yamaguchi A., et al. Proc. SPIE 5038 (2003) 689
18. Yamaguchi A., et al. Jpn. J. Appl. Phys. 42 (2003) 3763
19. Raptis I., et al. Microelectron. Eng. 61-62 (2002) 829
20. Constanitnos C.D., and Raptis I. Poymer 44 (2003) 251
21. Reiter G. Europhys. Lett. 23 (1993) 579
22. Keddie J.L., et al. Europhys. Lett. 27 (1994) 59
23. Forrest J.A., et al. Phys Rev. E58 (1998) R1226
24. Fryer D.S., et al. J. Vac. Sci. Technol. B18 (2000) 3376
25. See Y.-K., et al. Langmuir 16 (2000) 2351
26. Kim J.H., et al. Langmuir 17 (2001) 2703
27. Kajiyama T., et al. Macromolecules 27 (1994) 7932
28. Kajiyama T., et al. Macromolecules 30 (1997) 280
29. Kajiyama T., et al. Poymer 39 (1998) 4665
30. Tanaka K., et al. Langmuir 19 (2003) 6573
31. Constantoudis V., et al. J. Vac. Sci. Technol. B 21 (2003) 1019
32. Constantoudis V., et al. Proc. SPIE 5375 (2004) 967