Characterization of line edge roughness in resist patterns by using Fourier analysis and auto-correlation function

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3763-3770

  Yamaguchi, Atsuko ^a   Komuro, Osamu ^a,b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Auto correlation function; Fourier analysis; Line edge roughness; Periodicity

Indexed keywords

CORRELATION METHODS; FOURIER TRANSFORMS; IMAGE PROCESSING; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

LINE EDGE ROUGHNESS (LER);

ELECTRON BEAMS;

EID: 0041361764     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3763     Document Type: Conference Paper

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