Chemically amplified molecular resists for electron beam lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1115-1118

  Robinson, A P G ^a   Zaid, H M ^a   Gibbons, F P ^a   Palmer, R E ^a   Manickam, M ^a   Preece, J A ^a   Brainard, R ^b   Zampini, T ^b   O'Connell, K ^b  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b ROHM AND HAAS COMPANY   (United States)

Author keywords

Electron beam lithography; Fullerene; Molecular resist; Triphenylene

Indexed keywords

CARBON; FULLERENES; IRRADIATION; POLYMERS; SENSITIVITY ANALYSIS; SURFACE ROUGHNESS;

CHEMICAL AMPLIFICATION; MOLECULAR RESISTS; PHOTOINITIATORS; TRIPHENYLENES;

ELECTRON BEAM LITHOGRAPHY;

EID: 33748280238     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.151     Document Type: Article

References (17)

1. Merhari L., Gonsalves K.E., Hu Y., He W., Huang W.-S., Angelopoulos M., Bruenger W.H., Dzionk C., and Torkler M. Microelectron. Eng. 63 (2002) 391
2. International Sematech Roadmap, 2004.
3. Brainard R.L., Barclay G.G., Anderson E.H., and Ocola L.E. Microelectron. Eng. 61-62 (2002) 707
4. Fujita J., Ohnishi Y., Manako S., Ochiai Y., Nomura E., Sakamoto T., and Matsui S. Jpn. J. Appl. Phys. 36 (1997) 7769
5. Kihara N., Saito S., Ushirogouchi T., and Nakase M. J. Photopolym. Sci. Technol. 11 (1998) 553
6. Yoshiwa M., Kageyama H., Shirota Y., Wakaya F., Gamo K., and Takai M. Appl. Phys. Lett. 69 (1996) 2605
7. Kadota T., Kageyama H., Wakaya F., Gamo K., and Shirota Y. Chem. Lett. 33 (2004) 706
8. Kretz J., Dreeskornfeld L., Ilicali G., Lutz T., and Weber W. Microelectron. Eng. 78-79 (2005) 479
9. Robinson A.P.G., Palmer R.E., Tada T., Kanayama T., and Preece J.A. Appl. Phys. Lett. 72 (1998) 1302
10. Robinson A.P.G., Palmer R.E., Tada T., Kanayama T., Preece J.A., Philp D., Jonas U., and Deiderich F. Chem. Phys. Lett. 289 (1998) 586
11. Robinson A.P.G., Palmer R.E., Tada T., Kanayama T., Shelley E.J., Philp D., and Preece J.A. Chem. Phys. Lett. 312 (1999) 469
12. Robinson A.P.G., Palmer R.E., Tada T., Kanayama T., Allen M.T., Preece J.A., and Harris K.D.M. J. Phys. D 32 (1999) L75
13. Robinson A.P.G., Palmer R.E., Tada T., Kanayama T., Allen M.T., Preece J.A., and Harris K.D.M. J. Vac. Sci. Tech. B 18 (2000) 2730
14. Tada T., Kanayama T., Robinson A.P.G., Palmer R.E., Allen M.T., Preece J.A., and Harris K.D.M. Microelectron. Eng. 53 (2000) 435
15. A.P.G. Robinson, H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer, unpublished.
16. H.M. Zaid, A.P.G. Robinson, M. Manickam, J.A. Preece, R.E. Palmer, unpublished.
17. Manako S., Fujita J., Ochiai Y., Nomura E., and Matsui S. Jpn. J. Appl. Phys. 36 (1997) 7773