EB Resist Materials Consist of Catechol Derivatives

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 553-554

  Kihara, Naoko ^a   Saito, Satoshi ^a   Ushirogouchi, Tohru ^a   Nakase, Makoto ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Calixarenes; Cyclic oligomers; Resist

Indexed keywords

EID: 0009454023     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.553     Document Type: Article

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