Novel molecular resist based on derivative of cholic acid

Chemistry Letters

Volumn , Issue 10, 2002, Pages 1064-1065

  Kim, Jin Baek ^a   Yun, Hyo Jin ^a   Kwon, Young Gil ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHOLIC ACID; FLUORINE DERIVATIVE; GLYCEROL DERIVATIVE; GLYCEROL TRIS[GLUTARATE 3 (TERT BUTYLCHOLATE)]ESTER; MERCURY DERIVATIVE; UNCLASSIFIED DRUG; XENON;

ARTICLE; CHEMICAL STRUCTURE; SYNTHESIS;

EID: 0037027258     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2002.1064     Document Type: Article

References (8)

1. Y. Shirota, J. Mater. Chem., 10, 1 (2002).
2. Y. G. Kwon, J. B. Kim, T. Fujigaya, Y. Shibasaki, and M. Ueda, J. Mater. Chem., 12, 53 (2002).
3. K. Takeshi, R. Nakayama, and M. Ueda, Chem. Lett., 1998, 865.
4. H. R. Kricheldorf and B. Fechner, Macromolecules, 34, 3517 (2001).
5. -1): 1739 (C=O of ester), 1711 (C=O of acid).
6. -1): 2952 (aliphatic CH), 1797 (C=O of acyl chloride), 1740 (C=O of ester).
7. g) of GTGTBC is 84.0°C. The most conclusive molecular weight of GTGTBC was determined by MALDITOF MS spectrometry. The m/z value of GTGTBC appears as a main peak at 1773.57 which corresponds to the calculated value of 1773.83.
8. 4 gas flow rate, RF power, and pressure in chamber were 30 sccm, 100 W and 200mTorr, respectively. The dry-etching rate of resists formulated with GTGTBC and poly(4-hydroxystyrene) were obtained respectively by measuring the time needed for etching the resist film completely during reactive ion etching process.