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Volumn 45, Issue 6 B, 2006, Pages 5435-5439

Molecular resists based on cholate derivatives for electron-beam lithography

Author keywords

Chemically amplified positive tone resist; Cholic acid; Line edge roughness; Molecular resist

Indexed keywords

CHEMICAL BONDS; ELECTRON BEAMS; ESTERIFICATION; ESTERS; OPTICAL RESOLVING POWER; THIN FILMS;

CHEMICALLY AMPLIFIED POSITIVE-TONE RESIST; CHOLIC ACID; LINE EDGE ROUGHNESS; MOLECULAR RESIST; PHOTO-ACID GENERATOR (PAG);

ELECTRON BEAM LITHOGRAPHY;

EID: 33745659218 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5435 Document Type: Review

Times cited : (14)

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