SCOPUS 정보 검색 플랫폼

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 75-82

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

(11) Oshino, T a Shiraishi, M a Kandaka, N a Sugisaki, K a Kondo, H a Ota, K a Mashima, K a Murakami, K a Oizumi, H b Nishiyama, I b Okazaki, S b

a NIKON CORPORATION (Japan)

b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

Author keywords

Aspheric mirrors; Fly's eye element; Illumination optics; Projection optics; Wavefront error

Indexed keywords

COHERENT LIGHT; DEGREES OF FREEDOM (MECHANICS); DIFFRACTIVE OPTICS; ERRORS; IMAGE QUALITY; INTERFEROMETERS; MIRRORS; NUMERICAL METHODS; OPTICAL MATERIALS; ULTRAVIOLET RADIATION;

ASPHERIC MIRRORS; FLYS EYE ELEMENT; ILLUMINATION OPTICS; NUMERICAL APERTURE; PROJECTION OPTICS; WAVEFRONT ERROR;

LITHOGRAPHY;

EID: 0141682760 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.484936 Document Type: Conference Paper

Times cited : (21)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.