Resist materials for advanced lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 281-291

  Fedynyshyn, Theodore H ^a   Sinta, Roger F ^a   Pottebaum, Indira ^a   Cabral, Alberto ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Calixarenes; Line edge roughness; Photoresist

Indexed keywords

CALIXARENES; LINE EDGE ROUGHNESS; POLYDISPERSITIES; RESIST MATERIALS;

CATALYSIS; CHARACTERIZATION; MOLECULAR WEIGHT; PHOTORESISTS; POLYMERS; SENSITIVITY ANALYSIS; SURFACE ROUGHNESS;

LITHOGRAPHY;

EID: 24644451956     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600777     Document Type: Conference Paper

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