LER evaluation of molecular resist for EUV lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1084-1087

  Shiono, Daiju ^a   Hada, Hideo ^a   Yukawa, Hiroto ^a   Oizumi, Hiroaki ^b   Nishiyama, Iwao ^b   Kojima, Kyoko ^c   Fukuda, Hiroshi ^c  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b NTT CORPORATION   (Japan)

^c HITACHI LTD   (Japan)

Author keywords

EUV lithography; Line edge roughness; Molecular resist

Indexed keywords

EDGE DETECTION; MOLECULAR STRUCTURE; PATTERN RECOGNITION; PHOTORESISTS;

LINE EDGE ROUGHNESS; MOLECULAR RESISTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 34247623598     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.146     Document Type: Article

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