Ultimate fine-pitch resist patterning using the ASET-HINA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Oizumi, H ^a,b   Tanaka, Y ^a   Kumasaka, F ^a   Nishiyama, I ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemically amplified resist; Coherent illumination; EUV lithography; Molecular resist

Indexed keywords

IMAGING SYSTEMS; LIGHTING; PHENOLS; PHOTOLITHOGRAPHY; SIGNAL INTERFERENCE; ULTRAVIOLET RADIATION;

CHEMICALLY-AMPLIFIED RESIST; COHERENT ILLUMINATION; EUV LITHOGRAPHY; MOLECULAR RESIST;

PHOTORESISTS;

EID: 33745587281     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656050     Document Type: Conference Paper

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