Non-destructive method for monitoring glass transitions in thin photoresist films

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 829-834

  Raptis, Ioannis ^a   Diakoumakos, Constantinos D ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Glass transition temperature (Tg); Optical interferometry; Poly(2 hydroxylethyl methacrylate); Poly(methyl methacrylate); Thin films

Indexed keywords

GLASS TRANSITION; INTERFEROMETRY; MONITORING; NONDESTRUCTIVE EXAMINATION; OPTIMIZATION; PLASTIC FILMS; REFRACTIVE INDEX; THICK FILMS; THIN FILMS;

THIN PHOTORESIST FILMS;

PHOTORESISTS;

EID: 0036643635     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00503-8     Document Type: Conference Paper

References (11)