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note
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In order to investigate the scanning rate dependence of the adhesion force, the LFM measurement of the silicon wafer, which did not show viscoelastic properties and any scanning rate dependence of frictional force, was carried out under the same conditions as measurement of the monodisperse PS film. Since the scanning rate dependence of the lateral force was not observed, it seemed reasonable to conclude that the scanning rate dependence of the adhesion force was negligible in this scanning rate region.
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