Improvement of resist pattern collapse

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 925-933

  Watanabe, Manabu ^a   Tomo, Yoichi ^a,c   Yamabe, Masaki ^a   Kiba, Yukio ^b   Tanaka, Keiichi ^b   Naito, Ryoichiro ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

^c SONY CORPORATION   (Japan)

Author keywords

Pattern collapse; Rinse liquid sequence; Single layer; Surfactant

Indexed keywords

IMAGE PROCESSING; MONOLAYERS; OPTIMIZATION; PHOTOLITHOGRAPHY; SURFACE ACTIVE AGENTS; SURFACE STRUCTURE; ULTRAVIOLET RADIATION;

RESIST PATTERN COLLAPSE; RINSE LIQUID SEQUENCING; WAFER SPINNING;

PHOTORESISTS;

EID: 0141835918     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484978     Document Type: Conference Paper

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