Overcoming pattern collapse of ultra high resolution dense lines obtained with EUV resists

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 720-731

  Jouve, A ^a   Simon, J ^a   Foucher, J ^a   David, T ^a   Tortai, J H ^b   Solak, H ^c  

^a CEA LETI   (France)

^b CNRS   (France)

^c PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DEFORMATION; ELECTRON BEAM LITHOGRAPHY; ETCHING; INTERFEROMETRY; PHOTOLITHOGRAPHY; SYNCHROTRONS; ULTRAVIOLET RADIATION;

INTERFEROMETRY LITHOGRAPHY (IL); LINE DEFORMATION; PATTERN ADHESION; ULTRA HIGH RESOLUTION;

PHOTORESISTS;

EID: 24644469033     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598763     Document Type: Conference Paper

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