Overview of atomic layer etching in the semiconductor industry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 2, 2015, Pages

  Kanarik, Keren J ^a   Lill, Thorsten ^a   Hudson, Eric A ^a   Sriraman, Saravanapriyan ^a   Tan, Samantha ^a   Marks, Jeffrey ^a   Vahedi, Vahid ^a   Gottscho, Richard A ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; SILICON COMPOUNDS;

ASSISTED PROCESSING; ATOMIC LAYER ETCHING; ATOMIC SCALE; III-V COMPOUNDS; SEMICONDUCTOR INDUSTRY; SEQUENTIAL REACTION; THIN LAYERS;

SEMICONDUCTOR DEVICES;

EID: 84924311341     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4913379     Document Type: Review

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