Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 1853-1863

  Chang, Jane P ^a   Arnold, John C ^a,b   Zau, Gavin C H ^a   Shin, Hyung Shik ^a,c   Sawin, Herbert H ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b MOTOROLA INC   (United States)

^c Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031500120     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580652     Document Type: Article

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