Plasma etch challenges for FinFET transistors

Solid State Technology

Volumn 55, Issue 3, 2012, Pages

  Kanarik, Keren J ^a   Kamarthy, Gowri ^a   Gottscho, Richard A ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; COLLISION CASCADE; ENERGETIC ION; FILM SURFACES; ION ENERGIES; LOW ENERGY IONS; MOLECULAR LEVELS; OVER-ETCH; PLASMA ETCH; SI SUBSTRATES; STI STRUCTURES; TELECOMMUNICATIONS APPLICATIONS;

FINS (HEAT EXCHANGE); MONOLAYERS;

INTEGRATED CIRCUITS;

EID: 84860454310     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (0)