Surface analysis of atomic-layer-etched silicon by chlorine

Electrochemical and Solid-State Letters

Volumn 10, Issue 3, 2007, Pages

  Oh, C K ^a   Park, S D ^a   Lee, H C ^a   Bae, J W ^a   Yeom, G Y ^a,b  

^a Sungkyunkwan University   (South Korea)

^b National Program for Tera Level Devices   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; ETCHING; SURFACE ROUGHNESS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC-LAYER ETCHING (ALET); BONDING PEAKS; SILICON CHLORIDES;

SILICON COMPOUNDS;

EID: 33846616408     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2426414     Document Type: Article

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