|
|
Volumn 237-239, Issue 1-4 I, 2002, Pages 212-216
|
|
Adsorption, diffusion and desorption of Cl atoms on Si(1 1 1) surfaces
a
|
|
Author keywords
A1. Surface processes; A3. Chloride vapor deposition processes; B2. Semiconducting silicon
|
|
Indexed keywords
ACTIVATION ENERGY;
ADSORPTION;
APPROXIMATION THEORY;
CHEMICAL VAPOR DEPOSITION;
DESORPTION;
DIFFUSION;
EVAPORATION;
RATE CONSTANTS;
SURFACE REACTIONS;
LOCAL DENSITY APPROXIMATIONS;
RATE EQUATIONS;
SEMICONDUCTING SILICON COMPOUNDS;
|
|
EID: 0036530948
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)01904-2 Document Type: Conference Paper |
|
Times cited : (16)
|
|
References (17)
|
