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Volumn 68, Issue 4-6, 2001, Pages 189-230

Halogen etching of Si via atomic-scale processes

Author keywords

Etching; Halogens; Scanning tunneling microscopy; Silicon; Surface structure, morphology, roughness and topography

Indexed keywords

DESORPTION; DIMERS; ETCHING; HALOGEN COMPOUNDS; MOLECULAR ORIENTATION; PITTING; RESTORATION; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS; THERMAL EFFECTS;

EID: 0035883969     PISSN: 00796816     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0079-6816(01)00047-8     Document Type: Review
Times cited : (81)

References (90)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.