Layer by layer etching of the highly oriented pyrolythic graphite by using atomic layer etching

Journal of the Electrochemical Society

Volumn 158, Issue 12, 2011, Pages

  Kim, Y Y ^a   Lim, W S ^b   Park, J B ^b   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER ETCHING; GRAPHENE LAYERS; LAYER BY LAYER; OPTICAL MICROSCOPES; OXYGEN RADICAL; PARTICLE BEAM IRRADIATION; PEAK POSITION; PHYSICAL DAMAGES; RAMAN PEAK;

ADSORPTION; CHEMISORPTION; DESORPTION; ETCHING; GRAPHITE; MONOLAYERS;

GRAPHENE;

EID: 81355163420     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.061112jes     Document Type: Article

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