Erratum: History of atomic layer deposition and its relationship with the American Vacuum Society (Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films (2013)31 (050818) DOI: 10.1116/1.4816548);History of atomic layer deposition and its relationship with the American Vacuum Society

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 5, 2013, Pages

  Parsons, Gregory N ^a   Elam, Jeffrey W ^b   George, Steven M ^c   Haukka, Suvi ^d   Jeon, Hyeongtag ^e   Kessels, W M M ^f   Leskelä, Markku ^g   Poodt, Paul ^h   Ritala, Mikko ^g   Rossnagel, Steven M ⁱ  

^a North Carolina State University   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF COLORADO   (United States)

^d ASM Microchemistry Oy   (Finland)

^e Hanyang University   (South Korea)

^f EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^g UNIVERSITY OF HELSINKI   (Finland)

^h HOLST CENTRE   (Netherlands)

ⁱ IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ENTERTAINMENT INDUSTRY; FLEXIBLE STRUCTURES; SURFACE REACTIONS;

SCIENCE AND TECHNOLOGY; THIN FILM MATERIAL;

ATOMIC LAYER DEPOSITION;

EID: 84885162366     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/6.0000143     Document Type: Erratum

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