Process requirements for continued scaling of CMOS - The need and prospects for atomic-level manipulation

IBM Journal of Research and Development

Volumn 46, Issue 2-3, 2002, Pages 317-338

  Agnello, Paul D ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES;

SELF-LIMITED GROWTH;

CMOS INTEGRATED CIRCUITS;

EID: 0036508378     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.462.0317     Document Type: Article

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