Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3film using BCl3and Ar neutral beam

Applied Physics Letters

Volumn 105, Issue 9, 2014, Pages

  Jhon, Young I ^a   Min, Kyung S ^b   Yeom, G Y ^b,c   Jhon, Young Min ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NEUTRAL BEAMS; TIME-RESOLVED; ULTRA-THIN;

EID: 84907015401     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4894523     Document Type: Article

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