Realization of atomic layer etching of silicon

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3702-3705

  Athavale, Satish D ^a,b   Economou, Demetre J ^b  

^a Tegal Corporation   (United States)

^b University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5344239661     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588651     Document Type: Article

References (17)

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