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Volumn 544, Issue , 2013, Pages 2-12

Doping and electrical properties of cubic boron nitride thin films: A critical review

Author keywords

Cubic boron nitride; Doping; Electrical properties; Implantation; Thin films

Indexed keywords

CHEMICAL STABILITY; DEPOSITION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRONIC STRUCTURE; ENERGY GAP; FILM GROWTH; ION IMPLANTATION; NITRIDES; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; THERMAL CONDUCTIVITY; THIN FILMS;

EID: 84901849895     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.07.001     Document Type: Conference Paper
Times cited : (59)

References (85)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.