Electrical properties of Be-implanted polycrystalline cubic boron nitride films

Applied Physics Letters

Volumn 92, Issue 10, 2008, Pages

  He, B ^a   Zhang, W J ^a   Zou, Y S ^a   Chong, Y M ^a   Ye, Q ^a   Ji, A L ^a   Yang, Y ^a   Bello, I ^a   Lee, S T ^a   Chen, G H ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELECTRIC CONDUCTIVITY; PHASE COMPOSITION; SINGLE CRYSTALS; TEMPERATURE DISTRIBUTION;

IMPLANTATION DOSES; TEMPERATURE DEPENDENCE;

POLYCRYSTALLINE MATERIALS;

EID: 40849089264     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2896643     Document Type: Article

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