Electrical properties of boron nitride thin films grown by neutralized nitrogen ion assisted vapor deposition

Applied Physics Letters

Volumn 68, Issue 5, 1996, Pages 622-624

  Lu, Ming ^a   Bousetta, A ^a   Bensaoula, A ^a   Waters, K ^b   Schultz, J A ^b  

^a UNIVERSITY OF HOUSTON   (United States)

^b Ionwerks   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007614621     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116488     Document Type: Article

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