Stress measurement and stress relaxation during magnetron sputter deposition of cubic boron nitride thin films

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 131-135

  Abendroth, B ^a   Gago, R ^a   Kolitsch, A ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Cubic boron nitride; In situ analysis; Magnetron sputtering; Stress relaxation

Indexed keywords

COALESCENCE; CUBIC BORON NITRIDE; ELECTRIC POTENTIAL; ELLIPSOMETRY; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STRESS ANALYSIS; STRESS RELAXATION;

LASER DEFLECTION;

THIN FILMS;

EID: 1342305086     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01084-8     Document Type: Conference Paper

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